Characterizing optical phase-change materials with spectroscopic ellipsometry and polarimetry
نویسندگان
چکیده
This paper discusses the fundamentals, applications, potential and limitations of polarized light reflection techniques for characterization phase-change materials (PCMs). These include spectroscopic ellipsometry, time-resolved ellipsometry imaging as well polarimetry. We explore capabilities in determination extinction coefficient PCMs to characterize PCMs. show that is capable more than thickness optical properties, it can be exploited gain information about crystallization/amorphization kinetics mapping anisotropies.
منابع مشابه
Application of spectroscopic ellipsometry and Mueller ellipsometry to optical characterization.
This article provides a brief overview of both established and novel ellipsometry techniques, as well as their applications. Ellipsometry is an indirect optical technique, in that information about the physical properties of a sample is obtained through modeling analysis. Standard ellipsometry is typically used to characterize optically isotropic bulk and/or layered materials. More advanced tec...
متن کاملSpectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives
This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measur...
متن کاملellipsometry and Mueller matrix polarimetry
We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of th...
متن کاملInfrared spectroscopic ellipsometry: a tool for characterizing nanometer layers†
Ellipsometry is applied with visible light even for routine applications in industry. The technique provides two results, the so-called ellipsometric parameters which originally were meant to specify the elliptical polarization of reflected radiation. The two parameters can be used to determine simultaneously two quantities of the sample such as thickness and refractive index of a surface layer...
متن کاملOptical Monitoring of Thin-films Using Spectroscopic Ellipsometry
Spectroscopic Ellipsometry (SE) offers a precise technique for measuring thin film properties. Advanced SE instrumentation has been demonstrated as an excellent technique for monitoring the growth of optical films for sputtering applications. We have recently extended this technique for PVD E-gun evaporated films. In this paper we will show how an SE system was integrated into a standard optica...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2022
ISSN: ['1879-2731', '0040-6090']
DOI: https://doi.org/10.1016/j.tsf.2022.139580